30 July 2010

PhD Completion Seminar – Characterisation of Metal Oxide thin films deposited using advanced plasma techniques

Thursday 4 August 2010 – Presented by Mr Matthew Field


Title:

Characterisation of Metal Oxide thin films deposited using advanced plasma techniques

Speaker:

Mr Matthew Field, Applied Physics, School of Applied Sciences, RMIT University

Date:

2010-08-04

Time:

11.30 am – 12.30 pm

Location:

14.5.37 (Building14, level5, Rm37) – City Campus


Abstract

Metal oxide thin films are the subject of considerable research due to their novel optical and electrical properties which make them suitable for use in many applications. These applications include gas sensors, solar cell arrays, smart windows, display devices, gate dielectrics, semiconductors and many more.

It has been shown that depending on the deposition method used for film synthesis, different electrical and optical properties can be observed in the films. The electrical and optical properties of materials are linked to the microstructure. So to fully optimise a material for use in industry, we must first understand the structure of it on an atomic level. In this work, advanced microanalysis techniques are employed to understand the microstructure of metal oxide thin films deposited using novel deposition techniques.



Seminar Coordinator: Dr Michelle Spencer Tel. +61 3 9925 9697.