Course Title: Construct complex blocks for fashion garments

Part B: Course Detail

Teaching Period: Term1 2009

Course Code: GRAP5200C

Course Title: Construct complex blocks for fashion garments

School: 350T Fashion & Textiles

Campus: Brunswick Campus

Program: C5202 - Diploma of Applied Fashion Design and Technology

Course Contact : Mandy Penton

Course Contact Phone: +61 3 99259202

Course Contact Email:mandy.penton@rmit.edu.au


Name and Contact Details of All Other Relevant Staff

Teachers Names & contact details for Complex Pattern Development
Cathy Chen; 9925 9299; cathy.chen@rmit.edu.au
Jo Haddow; joanne.haddow@rmit.edu.au
Mimma Luppino; 9925 9256; mimma.luppino@rmit.edu.au
Anni Juracich; anni.juracich@rmit.edu.au

Teachers Names & contact details for Computer Pattern Making
Sam Cutajar; 9925 9259; sam.cutajar@rmit.edu.au
Hoa Pham; 9925 9237; hoa.pham@rmit.edu.au

Nominal Hours: 100

Regardless of the mode of delivery, represent a guide to the relative teaching time and student effort required to successfully achieve a particular competency/module. This may include not only scheduled classes or workplace visits but also the amount of effort required to undertake, evaluate and complete all assessment requirements, including any non-classroom activities.

Pre-requisites and Co-requisites

LMTFD4008A Construct stock size block for garment to meet size and fit specifications

Course Description

This unit covers the skills and knowledge to construct a range of complex blocks to be used for patterns of fashion garments with advanced styling requirements.


National Codes, Titles, Elements and Performance Criteria

National Element Code & Title:

LMTFD5014A Construct complex blocks for fashion garments

Element:

1. Analyse garment range composition

Performance Criteria:

1.1 Garments in range are confirmed.
1.2 Design sketches and drawings and specifications are interpreted and clarified with designer as required.
1.3 Intended purpose of design is established.
1.4 Profile of target market is obtained.
1.5 Designs are evaluated and recorded in relation to specification of fit model, body movement and comfort.
1.6 Fabric characteristics and performance, trims and finishing are considered in relation to the design

Element:

2. Construct the block

Performance Criteria:

2.1 Blocks are selected for fashion garments.
2.2 Block drafting principles and methods are selected for block construction.
2.3 Measurements and characteristics of fit model are analysed and entered into block drafting formulas and methodology.
2.4 Block is constructed using patternmaking technical skills and checked to ensure compliance with requirements, design specifications and standards.
2.5 Methods and formulas used are documented

Element:

3. Verify blocks for accuracy and suitability

Performance Criteria:

3.1 Block is checked either manually, by computer or by constructing a toile.
3.2 Where required, toiles are constructed from block.
3.3 Correct proportion, fit and balance and suitability of garment is verified and where required, minor adjustments are made.
3.4 Final blocks are completed, labelled and checked for accuracy and completeness to ensure compliance with specifications

Element:

4. Develop block portfolio for fashion label

Performance Criteria:

4.1 Blocks are presented in preparation for development of style patterns according to workplace requirements.
4.2 Blocks are stored on appropriate media.
4.3 Blocks are filed and stored

Element:

5. Maintain records

Performance Criteria:

5.1 Records are maintained and reports prepared, where necessary


Learning Outcomes


In this unit you will develop the skills and knowledge required in the construction of a range of blocks for pattern development of fashion garments that require advanced styling.

This Unit will be divided into two distinct learning areas to cover all the requried learning. One learning program will be based on manual pattern and block construction and development. The other  program will be structured around computer-aided software specific to the development of patterns and blocks. 


Details of Learning Activities

THIS COURSE HAS BEEN DIVIDED INTO TWO DISTINCT LEARNING AREAS, THAT COVER ALL THE LEARNING OUTCOMES REQUIRED. COMPLEX PATTERN DEVELOPMENT IS THE MANUAL DEVELOPMENT OF PATTERN BLOCKS AND PATTERNS. COMPUTER PATTERNMAKING IS THE DEVELOPMENT OF PATTERN BLOCKS AND PATTERNS USING COMPUTER USING EITHER THE LECTRA OR GERBER SOFTWARE PROGRAMS; THE TWO MOST COMMON PATTERN PROGRAMS USED INTERNATIONALLY IN THE FASHION INDUSTRY

Learning Activities Complex Pattern Development
This course will include:
1. Analysis of garment silhouettes
2. Constructing patterns/blocks by identifying the desired silhouette and fit requirements from given specifications.
3. Adjusting pattern/blocks according to fabric requirements by first checking fabric characteristics
4. Producing accurate patterns/blocks to industry standards. Checking pattern for such notches, seam allowances grain-lines and pattern information style numbers, size and cutting instructions.
5. Testing and adjusting the resulting fit by sewing toiles or prototypes.
6. Maintaining records by filling in specification forms and by storing patterns for easy access.


Learning Activities Computer Pattern Making
1. Retrieval and storage of pattern pieces by means of appropriate file formats and computer networks.
2. Use computer functions and menus to develop pattern according to required fit, style and specifications by use of different electronic pattern making techniques.
3. Producing sample patterns according to garment design details and specifications.
4. Testing and adjusting the resulting pattern by following specified quality procedures.
5. Finalisation of pattern pieces according to specification requirements by checking all the pattern pieces for accuracy and details such as correctly positioned notches, seam allowances and annotations (style numbers, size and cutting instructions).
6. Maintain records by filling in specification formats and by storing patterns for retrieval.



Teaching Schedule

Teaching schedule Complex Pattern Development
Week 1 -6
Jacket Block, fitted & unstructured, 2piece sleeve
Week 7 – 8
Complex sleeve methods
Week 9 – 14
Contour garments, strapless dress and bustier
Note: You will be given further information by your class teacher and the schedule may be subject to change with prior notification

Teaching schedule Computer Pattern Making
Week 1: Introduction, course guide and assessment requirements, Introduction to software and hardware. Occupational health and safety.
Week 2: Working with “models” and pieces Software menus and functions
Week 3: .Exercises: creating basic pattern shapes
Week 4: Class Exercises
Week 5: Start computer aided drafting and modifying pattern shapes
Week 6: Continue drafting and modifying pattern shapes
Week 7: Continue drafting and modifying pattern shapes
Week 8: Continue drafting and modifying pattern shapes
Week 9: Computer Patternmaking of a specified style(s)
Week 10: Computer Patternmaking of a specified style(s)
Week 11: Computer Patternmaking of a specified style(s)
Week 12: Computer Patternmaking of a specified style(s)
Week 13: Computer Patternmaking of a specified style(s)
Week 14: Start assignment
Week 15: Continue Assignment
Week 16: Assessment and Feedback


A more detailed schedule will be available at the start of the course.
The schedule may change. Prior notification will be given.


Learning Resources

Prescribed Texts


References

For Complex Pattern Development:
• Winifred Aldrich – Pattern cutting for women’s tailored jackets: Classic and Contemporary

For Complex Pattern Development:
• Helen Armstrong- Patternmaking for Fashion Designers

For Computer Pattern Making:
• Catherine Black. Modaris, Diamino, and JustPrint for Apparel Design. Fairchild, 2007

For Computer Pattern Making:
• Sharp, Julia Ridgway. Introduction to AccuMark, pattern design, and product data management.New York : Fairchild Publications, c2007.

For Computer Pattern Making:
• Jane D. Espinoza-Alvarado Computer aided fashion design using Gerber technology / Jane D. Espinoza-Alvarado. New York : Fairchild, 2007.


Other Resources

Essential Learning Resources students need to bring to Complex Pattern Development:
• Pattern Making Equipment and note taking equipment.

Essential Learning Resources students need to bring to Computer Pattern Making:
• Note taking equipment
• USB (Flash drive – “memory stick”)
• A4 document holder


Overview of Assessment

Detailed course and assessment requirements and information will be made available to you first week of class. Specific details will be explained to you during scheduled classes.

This course comprises both practical and theory components in two distinct areas, a simulated patternmaking workshop classroom and a Computer Laboratory. You will be expected to attend and participate in both learning programs and complete the required class activities.


As well as class activities you will be required to undertake research and assessment practice outside of regular class times and participate in formal assessment tasks.


PLEASE NOTE: work that has not been authenticated during class as your own work will not be considered for assessment.


Assessment Tasks

Assessment tasks Complex Pattern Development
All work must be completed and submitted by specified dates to be eligible for assessment.
• Jacket Project
• Contoured- strapless dress
• Contoured- bustier

Assessment tasks Computer Pattern Making
• Class exercises of specified styles
• Assignment: Development of a complete garment style.
• Final Practical Test


Assessment Matrix

Assessment matrix for Complex Pattern Development                            Jacket project      Contoured Strapless dress              Contour Bustier      
1.Analyse garment range compositionXXX
2. Construct the block XXX
3. Verify Blocks for accuracy and SuitabilityXXX
4. Develop block portfolio for fashion labelXXX
5. Maintain RecordsXXX

Assessment matrix for Computer Pattern MakingAssignmentClass exercises and Specified styles Test
1.Analyse garment range compositionXXX
2. Construct the block XXX
3. Verify Blocks for accuracy and Suitability XXX
4. Develop block portfolio for fashion label XXX
5. Maintain RecordsXXX

 

Course Overview: Access Course Overview