Course Title: Pattern Technology 4

Part A: Course Overview

Course Title: Pattern Technology 4

Credit Points: 12.00

Important Information:

Please note that this course may have compulsory in-person attendance requirements for some teaching activities.

To participate in any RMIT course in-person activities or assessment, you will need to comply with RMIT vaccination requirements which are applicable during the duration of the course. This RMIT requirement includes being vaccinated against COVID-19 or holding a valid medical exemption.

Please read this RMIT Enrolment Procedure as it has important information regarding COVID vaccination and your study at RMIT:

Please read the Student website for additional requirements of in-person attendance:

Please check your Canvas course shell closer to when the course starts to see if this course requires mandatory in-person attendance. The delivery method of the course might have to change quickly in response to changes in the local state/national directive regarding in-person course attendance.


Course Code




Learning Mode

Teaching Period(s)


Brunswick Campus


350T Fashion & Textiles


Sem 1 2017,
Sem 2 2017,
Sem 1 2018,
Sem 2 2018,
Sem 1 2019,
Sem 2 2019


Brunswick Campus


375T Vocational Design and Social Context


Sem 1 2020,
Sem 2 2020,
Sem 1 2021,
Sem 2 2021


Brunswick Campus


515T Creative Industries


Sem 1 2022,
Sem 2 2022

Course Coordinator: Betty Kanzurovski

Course Coordinator Phone: +61 3 99259232

Course Coordinator Email:

Pre-requisite Courses and Assumed Knowledge and Capabilities

You should have satisfactorily completed the prerequisite courses GRAP2619 Pattern Technology 3 before you commence this course.
It is a condition of enrolment at RMIT that you accept responsibility for ensuring that you have completed the prerequisite before enrolling in a course. For your information the RMIT Course Requisites policy can be found at:

Course Description

In this course you will begin to work more independently combining the skills you have learnt with more varied methods of pattern making. You will use experimentation and originality to extend your skills and knowledge of pattern making, applying these skills to the production of a commercial range of outfits for a specified target market.


Objectives/Learning Outcomes/Capability Development

In this course you will develop the following program learning outcomes:
1. Apply and creatively adapt a body of theoretical and technical knowledge and skills in fashion design and technology to your practice or future study
3. Investigate and work creatively to solve fashion design and production related problems
7. Apply initiative and judgement in planning, problem solving and decision making in your own work and working as part of a team

Upon successful completion of this course you will be able to:
1. Apply your theoretical knowledge to create supporting technical documentation
2.  Investigate, evaluate and apply advanced pattern-making principles in an efficient and sustainable way
3. Develop pattern specifications.
4. Experiment with the principles of patternmaking and grading to solve pattern design problems
5. Grade patterns, maintaining the integrity of the design and fit of the style
6. Work independently to create patterns with complex or detailed design

Overview of Learning Activities

You will be engaged in learning that involves a range of class activities such as practical exercises, group and class discussion, group activities/projects as well as online and self-directed learning.
During this course you will extend your manual pattern making skills for more advanced or detailed styles and attain computer skills in patternmaking, grading and marker making. You will also produce a library of patterns for use in your class activities, both manually and digitally.

Overview of Learning Resources

RMIT will provide you with resources and tools for learning in this course through our online systems.
A list of recommended learning resources will be provided by your lecturer, including books, journal articles and web resources. You will also be expected to seek further resources relevant to the focus of your own learning.
You will be working in a simulated patternmaking studio and have access to a range of existing patterns. In addition, you will be working in a computer laboratory with specialised industry software for the development of patterns.

The University Library has extensive resources for Fashion and Textiles students. The Library has produced a number of subject guides that includes quality online and print resources for your studies Fashion and Textiles Library Guides

The Library provides guides on academic referencing


Overview of Assessment

You will be assessed on how well you meet the course’s learning outcomes and on your development against the program learning outcomes.

Assessment for this course will cover practical components of complex pattern making, grading and marker making. Assessment activities will include developing patterns and specifications for an industry assignment, practical exercises and tests, projects.
You may be assessed independently or as part of a team project.

Ongoing feedback will be provided to enable you to monitor your own performance including detailed feedback on assessed tasks.

Your course assessment conforms to RMIT assessment principles, regulations, policies and procedures which are described and referenced under ’Assessment’ at student-essentials/assessment-and-exams

A Student Charter summarises your responsibilities as an RMIT student as well as those of your teachers.Students/support-and-facilities

If you have a long term medical condition and/or disability it may be possible to negotiate to vary aspects of the learning or assessment methods. You can contact the program coordinator or Equitable Learning Services if you would like to find out more:



 Assessment Type   Course Learning Outcomes (CLO) related assessments  Assessment Weighting
 1. CAD Pattern Pack  CLO 1,3,4,5  40%
 2. Capstone Collective Project - Develop & Complete  CLO 1,2,4,6 40% 
 3. Capstone Collective Project - Present Final collection  PLO 1,7 20%