Course Title: Construct complex blocks for fashion garments

Part B: Course Detail

Teaching Period: Term2 2010

Course Code: GRAP5246C

Course Title: Construct complex blocks for fashion garments

School: 350T Fashion & Textiles

Campus: Brunswick Campus

Program: C5220 - Diploma of Applied Fashion Design and Technology

Course Contact : Mandy Penotn

Course Contact Phone: +61 3 99259202

Course Contact Email:mandy.penton@rmit.edu.au


Name and Contact Details of All Other Relevant Staff

Teachers Names & contact details for Complex Pattern Development
Anni Juracich – email: anni.juracich@rmit.edu.au

Teachers Names & contact details for Computer Pattern Making
Mary Mirt; 9925 9243; mary.mirt@rmit.edu.au

 

Nominal Hours: 100

Regardless of the mode of delivery, represent a guide to the relative teaching time and student effort required to successfully achieve a particular competency/module. This may include not only scheduled classes or workplace visits but also the amount of effort required to undertake, evaluate and complete all assessment requirements, including any non-classroom activities.

Pre-requisites and Co-requisites

LMTFD4008B - Construct stock size block for garment to meet size and fit specifications

Course Description

This unit covers the skills and knowledge to construct a range of complex blocks to be used for patterns of fashion garments with advanced styling requirements.


National Codes, Titles, Elements and Performance Criteria

National Element Code & Title:

LMTFD5014B Construct complex blocks for fashion garments

Element:

1. Analyse garment range composition

Performance Criteria:

1.1 Garments in range are confirmed
1.2 Design sketches and drawings and specifications are
interpreted and clarified with designer as required
1.3 Intended purpose of design is established
1.4 Profile of target market is obtained
1.5 Designs are evaluated and recorded in relation to
specification of fit model, body movement and comfort
1.6 Fabric characteristics and performance, trims and finishing
are considered in relation to the design

Element:

2. Construct  the Block

Performance Criteria:

2.1 Blocks are selected for fashion garments
2.2 Block drafting principles and methods are selected for
block construction
2.3 Measurements and characteristics of fit model are
analysed and entered into block drafting formulas and
methodology
2.4 Block is constructed using pattern-making technical
skills and checked to ensure compliance with
requirements, design specifications and standards
2.5 Methods and formulas used are documented

Element:

3. Verify blocks for accuracy and suitability

Performance Criteria:

3.1 Block is checked either manually, by computer or by
constructing a toile
3.2 Where required, toiles are constructed from block
3.3 Correct proportion, fit and balance and suitability of
garment is verified and where required, minor adjustments
are made
3.4 Final blocks are completed, labelled and checked for
accuracy and completeness to ensure compliance with
specifications

Element:

4. Develop block portfolio for fashion label

Performance Criteria:

4.1 Blocks are presented in preparation for development of
style patterns according to workplace requirements
4.2 Blocks are stored on appropriate media
4.3 Blocks are filed and stored

Element:

5. Maintain Records

Performance Criteria:

5.1 Records are maintained and reports prepared, where
necessary


Learning Outcomes


In this unit you will develop the skills and knowledge required in the construction of a range of blocks for pattern development of fashion garments that require advanced styling.


This Course will be divided into two distinct learning areas to cover all the requried learning. One learning area will be based on manual pattern and block construction and development. The other learning area will be structured around computer-aided software specific to the development of patterns and blocks in the fashion industry.


Details of Learning Activities

THIS COURSE HAS BEEN DIVIDED INTO TWO DISTINCT LEARNING AREAS THAT COVER ALL THE LEARNING OUTCOMES REQUIRED. COMPLEX PATTERN DEVELOPMENT IS THE MANUAL DEVELOPMENT OF PATTERN BLOCKS AND PATTERNS. COMPUTER PATTERNMAKING IS THE DEVELOPMENT OF PATTERN BLOCKS AND PATTERNS ON COMPUTER USING EITHER THE LECTRA OR GERBER SOFTWARE PROGRAMS -THE TWO MOST COMMON PATTERN PROGRAMS USED INTERNATIONALLY IN THE FASHION INDUSTRY. YOU NEED TO BE DEEMED COMPETENT IN BOTH LEARNING AREAS TO PASS THIS COURSE.

Learning Activities Complex Pattern Development (64 HOURS)
This course will include:
1. Analysis of garment silhouettes
2. Constructing patterns/blocks by identifying the desired silhouette and fit requirements from given specifications.
3. Adjusting pattern/blocks according to fabric requirements by first checking fabric characteristics
4. Producing accurate patterns/blocks to industry standards. Checking pattern for such notches, seam allowances grain-lines and pattern information style numbers, size and cutting instructions.
5. Testing and adjusting the resulting fit by sewing toiles or prototypes.
6. Maintaining records by filling in specification forms and by storing patterns for easy access.


Learning Activities Computer Pattern Making (40HOURS)
1. Retrieval and storage of pattern pieces by means of appropriate file formats and computer networks.
2. Use computer functions and menus to develop pattern according to required fit, style and specifications by use of different electronic pattern making techniques.
3. Producing sample blocks and patterns according to garment design details and specifications.
4. Testing and adjusting the resulting pattern by following specified quality procedures.
5. Finalisation of pattern pieces according to specification requirements by checking all the pattern pieces for accuracy and details such as correctly positioned notches, seam allowances and annotations (style numbers, size and cutting instructions).
6. Maintain records by filling in specification formats and by correctly storing patterns for retrieval after electronic submission.


Teaching Schedule

Teaching schedule Complex Pattern Development (Manual)

Week 1 - 7
Jacket Block, fitted & unstructured, 2piece sleeve
Week 8 - 10
Complex sleeve methods
Week 11 - 12
Tailored Pant
Week 13 - 16
Contour Blocks
Note: You will be given further information by your class teacher and the schedule may be subject to change with prior notification

Teaching Schedule for Computer Aided Pattern Making

Week 1          Introduction to system
Week 2          Basic menus overview
Week 3          Draft gore skirts & develop variation 
Week 4          Draft skirt block
Week 5          Develop yoke skirt styles
Week 6          Continue yoke skirt styles
Week 7          Develop Collars & Sleeves
Week 8          Develop shirt style
Week 9          Develop pant style
Week 10        Digitising bustier block.  Develop bustier variation
                        Assessment Task 2 - sketch & draft plan due
Week 11        Continue bustier variation.   Assessment Task 1 DUE
Week 12        Assessment Task 2 – Own style development
Week 13        Assessment Task 2
Week 14        Assessment Task 2
Week 15        Assessment Task 2 DUE
Week 16        Assessment presentation/interview appointments 

Please note: This schedule is subject to change with prior notice


Learning Resources

Prescribed Texts


References

For Complex Pattern Development:
• Winifred Aldrich – Pattern cutting for women’s tailored jackets: Classic and Contemporary
• Helen Armstrong- Patternmaking for Fashion Designers
For Computer Pattern Making:
• Catherine Black. Modaris, Diamino, and JustPrint for Apparel Design. Fairchild, 2007
• Sharp, Julia Ridgway. Introduction to AccuMark, pattern design, and product data management.New York : Fairchild Publications, c2007.
• Jane D. Espinoza-Alvarado Computer aided fashion design using Gerber technology / Jane D. Espinoza-Alvarado. New York : Fairchild, 2007.


Other Resources

Essential Learning Resources students need to bring to Complex Pattern Development:
• Pattern Making Equipment and note taking equipment.

Essential Learning Resources students need to bring to Computer Pattern Making:
• Note taking equipment
• USB (Flash drive – “memory stick”)
• A4 document holder


Overview of Assessment

Detailed course and assessment requirements and information will be made available to you first week of class. Specific details will be explained to you during scheduled classes.

This course comprises both practical and theory components in two distinct areas, a simulated patternmaking workshop classroom and a Computer Laboratory. You will be expected to attend and participate in both learning programs and complete the required class activities.


As well as class activities you will be required to undertake research and assessment practice outside of regular class times and participate in formal assessment tasks.


PLEASE NOTE: work that has not been authenticated during class as your own work will not be considered for assessment.


Assessment Tasks

You must sucessfully pass both Manual and Computer-aided Patternmaking learning programs to pass this course. 

Complex Pattern Development (Manual Pattern Making)

• Jacket Assessment Task 1
• Contour Block Assessment Task 2
• Maintain Record Folio Assessment Task 3

* All work must be completed and submitted by specified dates to be eligible for assessment.

Assessment tasks Computer Pattern Making
• Class exercises of specified styles
• Assignment: Development of a complete garment style.
* You must sucessfully complete both of these assessment tasks to be deemed competent in Computer Pattern Making


Assessment Matrix

 Complex Pattern Assessment Jacket Assessment Task 1 Complex Pattern Assessment Contour Block Assessment Task 2Complex Pattern Assessment Maintain Record Folio Assessment Task 3Computer Pattern Making Class exercises Computer Pattern Making Individual Style Assignment
1.Analyse garment range composition XX XX
2. Construct the block XX X 
3. Verify Blocks for accuracy and Suitability XX XX
4. Develop block portfolio for fashion label XX XX
5. Maintain Records   XXX



Course Overview: Access Course Overview